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1999 4th International Symposium on Plasma Process-Induced Damage (Microfiche)
IEEE Electron Devices SocietyThis microfiche constitutes the proceedings from the International Symposium on Plasma Process-Induced Damage, which took place in 1999. Topics covered include plasma equipment, electron shading, device characterization and backend process integration.
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Product Description
This microfiche constitutes the proceedings from the International Symposium on Plasma Process-Induced Damage, which took place in 1999. Topics covered include plasma equipment, electron shading, device characterization and backend process integration.
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Product Details
General
Imprint | I.E.E.E.Press |
Country of origin | United States |
Release date | September 1999 |
Availability | We don't currently have any sources for this product. If you add this item to your wish list we will let you know when it becomes available. |
Authors | IEEE Electron Devices Society |
Format | Microfiche |
ISBN-13 | 978-0-7803-5189-9 |
Barcode | 9780780351899 |
Categories | |
LSN | 0-7803-5189-4 |
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