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Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design

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Applications of Plasma Processes to V.L.S.I.Technology (Hardcover) Loot Price: R1,316
Discovery Miles 13 160
Applications of Plasma Processes to V.L.S.I.Technology (Hardcover): Takuo Sugano
Applications of Plasma Processes to V.L.S.I.Technology (Hardcover): Takuo Sugano

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Applications of Plasma Processes to V.L.S.I.Technology (Hardcover)

Takuo Sugano

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Loot Price R1,316 Discovery Miles 13 160 | Repayment Terms: R122 pm x 12*

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This book presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, the book provides considerable insight into Japan's technological effort in this important area of science. Focused on research involving plasma deposition and dry etching, considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.

General

Imprint: John Wiley & Sons
Country of origin: United States
Release date: October 1985
Authors: Takuo Sugano
Dimensions: 230 x 150mm (L x W)
Format: Hardcover
Pages: 410
ISBN-13: 978-0-471-86960-3
Barcode: 9780471869603
Categories: Promotions
Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design
Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design > General
LSN: 0-471-86960-0

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