This book presents state-of-the-art research in microelectronic
processing for very large scale integration. Emphasizing
applications and techniques, the book provides considerable insight
into Japan's technological effort in this important area of
science. Focused on research involving plasma deposition and dry
etching, considerable attention is devoted to MOS gate fabrication,
the studies of the influence of process parameters on electrical
properties, dry processing technologies, and the theory of plasma
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