This Thesis discusses the basic principles of Lithographic
techniques incorporating the use of positive and negative
photoresists applications, synthetic techniques of photo imaging
compounds and light sensitive materials, uses of novel chlorinating
agents at mild conditions, direct esterification of sulfonicacid or
salts, photochemical studies of photo activating compounds,
resolution and optimization of the photo imaging compounds in
nanolithographic applications. Preparative and HPLC standardization
methods of photo activating compounds. Synthesis of photo acid
generators for nanotechnology applications, these are used in the
microelectronic industry. The microelectronic industry has made
remarkable progress with the development of integrated circuit (IC)
technology. Although EUV lithography at 13.5 nm wavelength has
emerged as a promising candidate to meet the resolution
requirements of the microelectronic industry roadmap, yet the
development of advanced photoresist materials with all of the
required imaging properties is still challenging and is one of the
major subjects of current nanolithography research.
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