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Chemical Vapor Deposition for Microelectronics - Principles, Technology, and Applications (Electronic book text, Reprint e.)
Arthur ShermanPresents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
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Product Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
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Product Details
General
Imprint | Noyes Publications |
Country of origin | United States |
Release date | November 1987 |
Availability | We don't currently have any sources for this product. If you add this item to your wish list we will let you know when it becomes available. |
Authors | Arthur Sherman |
Format | Electronic book text |
Pages | 226 |
Edition | Reprint e. |
ISBN-13 | 978-0-8155-1639-2 |
Barcode | 9780815516392 |
Categories | |
LSN | 0-8155-1639-8 |
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