X-Ray Diffraction at Elevated Temperatures - A Method for in Situ Process Analysis (Hardcover)

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This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.

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Product Description

This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.

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Product Details

General

Imprint

Wiley-VCH Verlag GmbH

Country of origin

Germany

Release date

March 1993

Availability

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Authors

,

Dimensions

235 x 155mm (L x W)

Format

Hardcover

Pages

272

ISBN-13

978-3-527-27842-8

Barcode

9783527278428

Subtitles

value

Categories

LSN

3-527-27842-7



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