1999 4th International Workshop on Statistical Metrology (Paperback)

This Workshop is a forum for discussion of issues in the generation and utilization of statistically significant measurements to characterize and validate VLSI processes, designs, and equipment operations. Innovative analysis techniques are used to convert raw measurements of confounded statistical and systematic variations into useful parameters that model the behavior of real processes and wafers. In this way, the coupling of statistical data from manufacturing to circuit and process design is enabled. Statistical Metrology is emerging as a necessary methodology to contain the cost and cycle time of advanced IC design and production.