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Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)

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Thin Films: Advances in Research and Development, Vol 22: Modeling of Film Deposition for Microelectronic Applications (Hardcover)
Thin Films: Advances in Research and Development, Vol 22: Modeling of Film Deposition for Microelectronic Applications...

Thin Films: Advances in Research and Development, Vol 22: Modeling of Film Deposition for Microelectronic Applications (Hardcover)

Maurice H. Francombe, John Vossen

Series: Thin Films

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This serial contains studies of the properties of various thin films materials and systems. This volume presents five different models of computer simulation techniques to thin film deposition as applied to modern microelectronics. The book focuses on the simulation and experimental confirmation of how surfaces evolve on a microscopic scale during thin film processing in relation to semiconductor dimensions. There are two general classes of model: the molecular dynamics model and the shock-tracking model, and several chapters cover each approach. The chapters contain general physics relevant to the model, the general mathematical construction of the model (criteria consevation laws, etc), and a comparison of modelling and results relevant to the particular model. Each chapter covers the individual's lab approach rather than the entire field and is heavily referenced.

General

Imprint: Elsevier health sciences
Country of origin: United Kingdom
Series: Thin Films
Release date: 1997
Editors: Maurice H. Francombe • John Vossen
Dimensions: 229 x 152mm (L x W)
Format: Hardcover
Pages: 250
ISBN-13: 978-0-12-533022-0
Categories: Books > Computing & IT > Applications of computing > Computer modelling & simulation
Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)
Books > Professional & Technical > Mechanical engineering & materials > Materials science > General
LSN: 0-12-533022-7
Barcode: 9780125330220

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