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The Chemistry of Metal CVD (Electronic book text, 1st edition)
The Chemistry of Metal CVD (Electronic book text, 1st edition): Toivo T. Kodas, Mark J Hampden-Smith

The Chemistry of Metal CVD (Electronic book text, 1st edition)

Toivo T. Kodas, Mark J Hampden-Smith

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High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies.
From Reviews:
'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.'
J. Am Chem. Soc.

General

Imprint: Wiley-VCH Verlag GmbH
Country of origin: United Kingdom
Release date: September 2008
First published: 2008
Authors: Toivo T. Kodas • Mark J Hampden-Smith
Format: Electronic book text
Pages: 562
Edition: 1st edition
ISBN-13: 978-3-527-61584-1
Categories: Books > Professional & Technical > Mechanical engineering & materials
Books > Professional & Technical > Mechanical engineering & materials > Materials science
Books > Professional & Technical > Mechanical engineering & materials > Materials science > General
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LSN: 3-527-61584-9
Barcode: 9783527615841

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