CMP and polishing are the most precise processes used to finish
the surfaces of mechanical and electronic or semiconductor
components. Advances in CMP/Polishing Technologies for Manufacture
of Electronic Devices presents the latest developments and
technological innovations in the field - making cutting-edge
R&D accessible to the wider engineering community.
Most of the applications of these processes are kept as
confidential as possible (proprietary information), and specific
details are not seen in professional or technical journals and
magazines. This book makes these processes and applications
accessible to a wider industrial and academic audience.
Building on the fundamentals of tribology - the science of
friction, wear and lubrication - the authors explore the practical
applications of CMP and polishing across various market sectors.
Due to the high pace of development of the electronics and
semiconductors industry, many of the presented processes and
applications come from these industries.
Demystifies scientific developments and technological
innovations, opening them up for new applications and process
improvements in the semiconductor industry and other areas of
Explores stock removal mechanisms in CMP and polishing, and the
challenges involved in predicting the outcomes of abrasive
processes in high-precision environments.
The authors bring together the latest innovations and research
from the USA and Japan.
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