Analysis and Characterization of the System Si Nanocluster/Siox (Paperback)


This book reviews the subject of Si quantum dots embedded in dielectric andits application to the realization of non volatile semiconductor memories and optoelectronicdevices, this dialing various approaches for the analysis of the materialsthrough transmission electron microscopy (TEM). The advantages coming froman innovative application of energy filtered TEM (EFETM) are put in clear evidence. Themanuscript then focuses on the synthesis of the materials: three different methodologiesfor the realization of the dots based on chemical vapor deposition (CVD)and ion implantation are described in detail, and physical models providing someunderstanding of the observed phenomenology are reported as well.

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Product Description

This book reviews the subject of Si quantum dots embedded in dielectric andits application to the realization of non volatile semiconductor memories and optoelectronicdevices, this dialing various approaches for the analysis of the materialsthrough transmission electron microscopy (TEM). The advantages coming froman innovative application of energy filtered TEM (EFETM) are put in clear evidence. Themanuscript then focuses on the synthesis of the materials: three different methodologiesfor the realization of the dots based on chemical vapor deposition (CVD)and ion implantation are described in detail, and physical models providing someunderstanding of the observed phenomenology are reported as well.

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Product Details

General

Imprint

Lap Lambert Academic Publishing

Country of origin

Germany

Release date

July 2011

Availability

Expected to ship within 10 - 15 working days

First published

July 2011

Authors

Dimensions

229 x 152 x 7mm (L x W x T)

Format

Paperback - Trade

Pages

112

ISBN-13

978-3-8454-2031-8

Barcode

9783845420318

Categories

LSN

3-8454-2031-6



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