Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.
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Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.
Imprint | Springer-Verlag |
Country of origin | Germany |
Series | Springer Series in Advanced Microelectronics, 16 |
Release date | October 2010 |
Availability | Expected to ship within 10 - 15 working days |
First published | 2005 |
Editors | Howard Huff, David Gilmer |
Dimensions | 235 x 155 x 37mm (L x W x T) |
Format | Paperback |
Pages | 710 |
Edition | Softcover reprint of hardcover 1st ed. 2005 |
ISBN-13 | 978-3-642-05921-6 |
Barcode | 9783642059216 |
Categories | |
LSN | 3-642-05921-X |